Agilent JetClean self-cleaning ion source for GC/MS
Turn Cleaning Time
into Productive Time
Agilent JetClean self-cleaning ion source for GC/MS
Want to reduce or eliminate manual GC/MS source cleaning?
The Agilent JetClean self-cleaning ion source greatly
reduces—or even eliminates—the need for source cleaning on Agilent single and triple quadrupole GC/MS systems.*
A controlled flow of hydrogen keeps the ion source free from contamination, protecting the integrity of your results. There’s no disassembly, scrubbing, or recalibration required.
Excludes diffusion pump systems. Certain older Agilent GC/MS systems are not compatible with JetClean. Ask your Agilent representative for more information.
Save time and money with the JetClean self-cleaning ion source for GC/MS
Real-world value:
Manual cleaning vs. JetClean self-cleaning ion source
How much more could you accomplish with less downtime?
Innovation minute
What if you could operate for months—
or years—without cleaning your source? This innovation minute gives you a closer look at the technology behind the JetClean self-cleaning ion source.
Customer testimonial from the Nagoya Institute of Technology
Professor Hajime Ohtani of the Nagoya Institute of Technology shares his experience with JetClean technology and its advantages.
Innovation minute
What if you could operate for months—
or years—without cleaning your source? This innovation minute gives you a closer look at the technology behind the JetClean self-cleaning ion source.
Customer testimonial from the Nagoya Institute of Technology
Professor Hajime Ohtani of the Nagoya Institute of Technology shares his experience with JetClean technology and its advantages.
What other JetClean users are saying…
More resources for optimizing your GC/MS workflow
Application notes
EU Priority PAH Analysis in Pumpkin Seed Oil Using Bond Elut EMR–Lipid Cleanup by GC/MS/MS
Contaminants in Ethylene and Propylene: Ultra Trace Level Detection
PAHS Analysis in Palm Oil: Significant Robustness Improvements
Agilent JetClean: In-situ GC/MS Ion Source Cleaning and Conditioning